Field effect (semiconductor)

In physics, the field effect refers to the modulation of the electrical conductivity of a material by the application of an external electric field.

In a metal, the electron density that responds to applied fields is so large that an external electric field can penetrate only a very short distance into the material. However, in a semiconductor the lower density of electrons (and possibly holes) that can respond to an applied field is sufficiently small that the field can penetrate quite far into the material. This field penetration alters the conductivity of the semiconductor near its surface, and is called the field effect. The field effect underlies the operation of the Schottky diode and of field-effect transistors, notably the MOSFET, the JFET and the MESFET.

Surface conductance and band bending

The change in surface conductance occurs because the applied field alters the energy levels available to electrons to considerable depths from the surface, and that in turn changes the occupancy of the energy levels in the surface region. A typical treatment of such effects is based upon a band-bending diagram showing the positions in energy of the band edges as a function of depth into the material.

An example band-bending diagram is shown in the figure. For convenience, energy is expressed in eV and voltage is expressed in volts, avoiding the need for a factor q for the elementary charge. In the figure, a two-layer structure is shown, consisting of an insulator as left-hand layer and a semiconductor as right-hand layer. An example of such a structure is the MOS capacitor, a two-terminal structure made up of a metal gate contact, a semiconductor body (such as silicon) with a body contact, and an intervening insulating layer (such as silicon dioxide, hence the designation O).